By Cher Ming Tan, Wei Li, Zhenghao Gan, Yuejin Hou

Applications of Finite point equipment for Reliability reviews on ULSI Interconnections offers a close description of the appliance of finite point tools (FEMs) to the examine of ULSI interconnect reliability. over the last 20 years the applying of FEMs has turn into common and maintains to guide to a higher figuring out of reliability physics.

To support readers do something about the expanding sophistication of FEMs’ purposes to interconnect reliability, Applications of Finite aspect equipment for Reliability experiences on ULSI Interconnections will:

  • introduce the primary of FEMs;
  • review numerical modeling of ULSI interconnect reliability;
  • describe the actual mechanism of ULSI interconnect reliability encountered within the electronics undefined; and
  • discuss intimately using FEMs to appreciate and enhance ULSI interconnect reliability from either the actual and sensible point of view, incorporating the Monte Carlo method.

A full-scale evaluate of the numerical modeling method utilized in the examine of interconnect reliability highlights helpful and memorable ideas which have been constructed lately. Many illustrations are used during the booklet to enhance the reader’s knowing of the method and its verification. real experimental effects and micrographs on ULSI interconnects also are included.

Applications of Finite aspect tools for Reliability reports on ULSI Interconnections is an effective reference for researchers who're engaged on interconnect reliability modeling, in addition to if you happen to need to know extra approximately FEMs for reliability purposes. It offers readers an intensive realizing of the purposes of FEM to reliability modeling and an appreciation of the strengths and weaknesses of varied numerical types for interconnect reliability.

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Extra info for Applications of Finite Element Methods for Reliability Studies on ULSI Interconnections

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Mahadevan M, Bradley RM (1999) Simulations and theory of electromigration-induced slit formation in unpassivated single-crystal-metal lines. Phys Rev B 59:11037 37. Fix G (1983) Free boundary problems. In: Fasano A, Primicero M (eds) Research notes in mathematics, vol 2. Pitman, New York 36 2 Physics-Based Modeling for ULSI Interconnections Failure Mechanisms 38. Collins JB, Levine H (1985) Diffuse interface model of diffusion-limited crystal growth. Phys Rev B 31:6119 39. Bhate DN, Kumar A, Bower AF (2000) Diffuse interface model for electromigration and stress voiding.

J Appl Phys 73:3790 References 35 12. Clement JJ, Thompson CV (1995) Modeling electromigration-induced stress evolution in confined metal lines. J Appl Phys 78:900 13. Park YJ, Andleigh VK, Thompson CV (1999) Simulations of stress evolution and the current density scaling of electromigration-induced failure times in pure and alloyed interconnects. J Appl Phys 85:3546 14. Park YJ, Thompson CV (1997) The effects of the stress dependence of atomic diffusivity on stress evolution due to electromigration.

Theoretical mechanics deals with fundamental laws and principles of mechanics. Applied mechanics are the applications of the theoretical knowledge to scientific and engineering problems, where a critical procedure is to construct mathematical models for the physical phenomena. Computational mechanics solves specific scientific and engineering problems through numerical methods implemented in computers. The FEM was originated from the need for such numerical analysis in computational mechanics. There are numerous textbooks introducing the FEM [15, 16].

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